Microwave plasma CVD diamond reactor for research and production
The CTS10U is Carat Systems' flagship microwave plasma CVD diamond reactor. Building on reactor concepts pioneered by the ASTeX team, the CTS10U incorporates modern high-purity vacuum engineering, advanced process control, high microwave power capability, and upgradeable architecture for research, pilot production, and commercial diamond manufacturing.
CTS10U microwave plasma CVD diamond technology for advanced diamond deposition processes.
Applications
Electronic and optical diamond
High-purity diamond growth for electronic, detector, optical, and research applications.
Diamond-on-silicon
Process development for diamond-coated silicon wafers and thermal spreader applications.
UNCD and BEN processes
Bias enhanced nucleation, UNCD growth, and application-specific diamond-substrate interfaces.
Single crystal diamond
Growth of single crystal CVD diamond for gem, optical, electronic, and technical applications.
Polycrystalline wafers
Polycrystalline CVD diamond wafers, plates, windows, and coating development.
Fusion and harsh environments
Diamond coatings for plasma-facing, radiation-tolerant, chemically resistant, and high-heat-flux applications.
Advanced reactor features
- High-purity vacuum architecture for low-contamination diamond growth.
- Differentially pumped elastomer seals and conflat-style sealing options for improved purity control.
- Microwave power capability for larger-area growth and higher growth-rate process windows.
- Broad pressure process range for electronic diamond, optical diamond, polycrystalline coatings, and single crystal growth.
- Customizable fixturing and viewport access for in-situ monitoring and process development.
- Advanced process control, logging, interlocks, and remote diagnostic capability.
Indispensable capabilities
- Bias Enhanced Nucleation (BEN) supports controlled diamond-substrate interface formation, diamond-on-silicon development, and epitaxial process routes.
- 100 mm class wafer capability for microcrystalline and nanocrystalline diamond film development.
- Temperature-controlled stage and translation options for single crystal and substrate-sensitive growth.
- Window protection geometry to reduce quartz-related silicon contamination from atomic hydrogen exposure.
- Stable plasma operation across a wide range of pressure, power, and substrate geometries.
- Integrated helium leak testing access.
- Upgradeable microwave power and process options.
- Electronic-grade diamond growth capability.
BEN fundamentals | Low TBR via carbide interfaces | Thermal conductance vs nucleation
Demonstrated results
- Polycrystalline and single crystal CVD diamond growth.
- Diamond-on-silicon and wafer-scale coating development.
- Diamond detectors and electronic diamond material development.
- White diamond tube: approximately 5 mm ID and 2 cm long.
- Gem-quality single crystal CVD diamond growth.
Process development and support
Carat supports customers who need more than a standard reactor purchase. We help define substrate handling, process windows, film targets, temperature control, plasma conditions, nucleation strategy, and metrology plans for demanding CVD diamond applications.
- Diamond growth recipe development
- Thickness uniformity and bow optimization
- Diamond-on-silicon process development
- BEN and UNCD process development
- Sample coating programs
- Technology transfer and training
System options
The CTS10U platform is designed to support a wide range of customer requirements, from research flexibility to production-oriented operation.
- Microwave power upgrades
- Moving and temperature-controlled stages
- Bias capability for BEN and related processes
- Custom fixturing and substrate holders
- Viewport and diagnostic access
- Control software customization and remote monitoring
- Training, commissioning, and process startup support
CTS10U platform summary
The CTS10U is intended for customers developing advanced CVD diamond materials where reactor purity, process range, control architecture, substrate handling, and upgradeability matter. Typical programs include electronic diamond, optical diamond, diamond-on-silicon thermal spreaders, UNCD/BEN process development, single crystal growth, polycrystalline wafers, and custom coating applications.
For larger-area production scale-up, Carat also develops 915 MHz high-power microwave plasma CVD platforms.